We do this by putting a photomask over the wafer, and turning on a powerful light.

我们通过在晶圆上放置光掩模并打开强大的灯来做到这一点。

Photoresists aren’t very useful by themselves, but are super powerful when used in conjunction with a photomask.

光刻胶本身不是很有用，但与光掩模结合使用时非常强大。

Once more, we apply a photoresist, and use a new photomask to etch little channels.

再一次，我们应用光刻胶，并使用新的光掩模来蚀刻小通道。

Now, we use a photomask with a new and different pattern, allowing us to open a small window above the doped area.

现在，我们使用具有新的不同图案的光掩模，允许我们在掺杂区域上方打开一个小窗口。

In our example, we made one transistor, but in the real world, photomasks lay down millions of little details all at once.

在我们的示例中，我们制作了一个晶体管，但在现实世界中，光掩模一次放置了数百万个小细节。

So, very similar to before, we apply a photoresist, use a photomask, dissolve the exposed resist, and use a chemical to remove any exposed metal.

因此，与之前非常相似， 我们应用光刻胶， 使用光掩模， 溶解暴露的抗蚀剂，并使用化学物质去除任何暴露的金属。

Although we could create a photomask for an entire wafer, we can take advantage of the fact that light can be focused and projected to any size we want.

虽然我们可以为整个晶圆制作光掩模，但我们可以利用光可以聚焦并投射到我们想要的任何尺寸这一事实。

First, we’re bumping into limits on how fine we can make features on a photomask and it’s resultant wafer due to the wavelengths of light used in photolithography.

首先，由于光刻中使用的光的波长，我们在光掩模和最终晶圆上制作特征的精细程度遇到了限制。

In the same way that a film can be projected to fill an entire movie screen, we can focus a photomask onto a very small patch of silicon, creating incredibly fine details.

就像电影可以投影到整个电影屏幕一样，我们可以将光掩模聚焦到非常小的硅片上，创造出令人难以置信的精细细节。