Reactive-ion etching

A diagram of a common RIE setup. An RIE consists of two electrodes (1 and 4) that create an electric field (3) meant to accelerate ions (2) toward the surface of the samples (5).

Reactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than wet etching. RIE uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High-energy ions from the plasma attack the wafer surface and react with it.

单词	Reactive ion etch
释义	Reactive ion etch 英语百科 Reactive-ion etching Reactive-ion etching (RIE) is an etching technology used in microfabrication. RIE is a type of dry etching which has different characteristics than wet etching. RIE uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High-energy ions from the plasma attack the wafer surface and react with it.
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Reactive ion etch

Reactive-ion etching