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单词 photoetching
释义

photoetching

英汉-汉英词典
照相版
词组 | 习惯用语
您要查找的是不是:
  • photochemical adj. 光化作用的;光化学的
  • photoengraving n. 照相凸版,照相凸版印刷
  • photofinishing n. 照相洗印加工,照相洗印服务
  • photochemistry n. 光化学
photoetching n. 光刻,[电子] 光刻法;照相腐蚀法;照相感光制凸版
automatic projection photoetching machine 自动投影光刻机

网络短语:
photoetching glue 光刻胶
photoetching material 光刻材料
latent-image photoetching 无显影光刻
photoetching detail 光刻
photoetching method 光刻法
photoetching objectives 光刻物镜
photoetching machine 光刻机
cd photoetching 光盘刻录
photoetching technique 光刻技术
laser photoetching 激光光刻
英语例句库
  1. Brazing quality and product reliability are both increased as using high frequency pulse microplasma arc heating process for assembly brazing of cathode and photoetching grid of electron tube.
    采用高频脉冲微束等离子弧做为电子管阴极和光刻栅极装配钎焊工艺的热源,提高了钎缝质量和产品的可靠性.

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中文百科

光刻 Photolithography

(重定向自Photoetching)
在硅芯片上涂光阻剂的甩胶机
Obleas fotolitografiadas.
Parte del wafertrack empleada para ser iluminada con luz de 365 nm (ultravioleta).
Simplified illustration of dry etching using positive photoresist during a photolithography process in semiconductor microfabrication (not to scale).

光刻英语:photolithography)是半导体器件制造工艺中的一个重要步骤,该步骤利用曝光和显影在光刻胶层上刻画几何图形结构,然后通过刻蚀工艺将光掩模上的图形转移到所在衬底上。这里所说的衬底不仅包含硅晶圆,还可以是其他金属层、介质层,例如玻璃、SOS中的蓝宝石。

英语百科

Photolithography 光刻

(重定向自Photoetching)
Simplified illustration of dry etching using positive photoresist during a photolithography process in semiconductor microfabrication (not to scale).
The wafer track portion of an aligner that uses 365 nm ultraviolet light
The filtered fluorescent lighting in photolithography cleanrooms contains no ultraviolet or blue light in order to avoid exposing photoresists. The spectrum of light emitted by such fixtures gives virtually all such spaces a bright yellow color.
One of the evolutionary paths of lithography has been the use of shorter wavelengths. It is worth noting that the same light source may be used for several technology generations.

Photolithography, also termed optical lithography or UV lithography, is a process used in microfabrication to pattern parts of a thin film or the bulk of a substrate. It uses light to transfer a geometric pattern from a photomask to a light-sensitive chemical "photoresist", or simply "resist," on the substrate. A series of chemical treatments then either engraves the exposure pattern into, or enables deposition of a new material in the desired pattern upon, the material underneath the photo resist. For example, in complex integrated circuits, a modern CMOS wafer will go through the photolithographic cycle up to 50 times.

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更新时间:2025/6/17 20:12:01