Nanolithography

Nanolithography is the branch of nanotechnology concerned with the study and application of fabricating nanometer-scale structures, meaning patterns with at least one lateral dimension between 1 and 100 nm. Different approaches can be categorized in serial or parallel, mask or maskless/direct-write, top-down or bottom-up, beam or tip-based, resist-based or resist-less methods. As of 2015, nanolithography is a very active area of research in academia and in industry. Applications of nanolithography include among others: Multigate devices such as Field effect transistors (FET), Quantum dots, Nanowires, Gratings, Zone plates and Photomasks, nanoelectromechanical systems (NEMS), or semiconductor integrated circuits (nanocircuitry).