Chemical vapor deposition

DC plasma (violet) enhances the growth of carbon nanotubes in laboratory-scale PECVD apparatus

Chemical vapor deposition (CVD) is a chemical process used to produce high quality, high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.

单词	Low pressure chemical vapor deposition
释义	Low pressure chemical vapor deposition 英语百科 Chemical vapor deposition Chemical vapor deposition (CVD) is a chemical process used to produce high quality, high-performance, solid materials. The process is often used in the semiconductor industry to produce thin films. In typical CVD, the wafer (substrate) is exposed to one or more volatile precursors, which react and/or decompose on the substrate surface to produce the desired deposit. Frequently, volatile by-products are also produced, which are removed by gas flow through the reaction chamber.
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Low pressure chemical vapor deposition

Chemical vapor deposition