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单词 Hafnium silicate
释义

Hafnium silicate

中文百科

硅酸铪 Hafnium(IV) silicate

(重定向自Hafnium silicate)

硅酸铪是铪的硅酸盐,化学式HfSiO4

在现代半导体组件中,可以使用由原子层沉积、化学气相沉积或MOCVD生长的硅酸铪和硅酸锆薄膜,作为高κ电介质替换二氧化钛。二氧化铪中的硅增大了能隙,同时降低相对电容率。此外,它还提高了非晶膜的结晶化温度,并进一步增强了材料在高温下与硅的热稳定性。有时会向硅酸铪中加入氮以提高热稳定性和设备的电性能。

英语百科

Hafnium(IV) silicate 硅酸铪

(重定向自Hafnium silicate)

Hafnium silicate is the hafnium(IV) salt of silicic acid with the chemical formula of HfSiO4.

Thin films of hafnium silicate and zirconium silicate grown by atomic layer deposition, chemical vapor deposition or MOCVD, can be used as a high-k dielectric as a replacement for silicon dioxide in modern semiconductor devices. The addition of silicon to hafnium oxide increases the band gap, while decreasing the dielectric constant. Furthermore, it increases the crystallization temperature of amorphous films and further increases the material's thermal stability with Si at high temperatures. Nitrogen is sometimes added to hafnium silicate for improving the thermal stability and electrical properties of devices.

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更新时间:2025/6/20 8:27:30